| 摘要 |
<p>A photosensitive polymer comprises a macromolecular chain contg. mostly recurring styrene and/or diene units on which are statistically grafted via ester gps. lateral chains having photopolymerisable double bonds. The polymer can be used in paints, varnishes, adhesives or inks and for the prodn. of resist layers for printed circuits, offset plates, etc. The macromolecular chain is rpef. a styrene-butadiene copolymer or a styrene-isoprene copolymer. Molar ratio styrene/diene is 1:1-1:3. The photosensitive is of the formula: R(YC-CX)q-CO-R1 (where R is H, 1-10C aliphatic gp., furfuryl or an aromatic gp. which can be substd. by alkyl, alkoxy, NO2; R1 is O or S or a hydrocarbon gp. contg. O or S; X and Y are H, halogen, CN, NO2 or phenyl and q is 1 or 2).</p> |
