| 摘要 |
An FPD(Flat Panel Display) substrate using a repetition image and a semiconductor wafer inspection system are provided to enhance the accuracy of an inspection process by obtaining a multi-dimensional image by using one or more lighting unit. One or more first lighting unit(120) is installed at a direction corresponding to a camera(110) to irradiate light necessary for the camera. One or more second lighting unit(140) is installed in parallel to the camera to irradiate the light necessary for the camera. A reflecting mirror(130) refracts the light of the first lighting unit to irradiate the light onto an FPD or a semiconductor wafer. The camera is installed at an upper side of the FPD or the semiconductor wafer to photograph the reflecting light of the light of the first lighting unit from the FPD or the semiconductor wafer or the reflecting light of the light of the second lighting unit from the FPD or the semiconductor wafer. A pulse generation unit generates a pulse signal to operate the first lighting unit, the second lighting unit, and the camera and to correct a photographed image. A synchronous signal generation unit generates a synchronous signal according to the pulse signal. An operational signal generation unit generates an operational signal according to the synchronous signal. An image analysis unit analyzes a repetition scanning image. An odd scanning image adder extracts only odd scanning lines from the repetition scanning image. An even scanning image adder extracts only even scanning lines from the repetition scanning image. A scanning addition image output unit outputs the scanning images of the odd scanning image adder and the even scanning image adder. An inspection controller includes a central control unit to control operations of the pulse generation unit, the synchronous signal generation unit, the operational signal generation unit, the image analysis unit, the odd scanning image adder, the even scanning image adder, and the scanning addition image output unit.
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