发明名称 Semiconductor optical device and manufacturing method thereof
摘要 In a p-type clad layer, not only a p-type dopant Zn but also Fe is doped. Its Zn concentration is 1.5 × 10 18 cm -3 and the Fe concentration is 1.8 × 10 17 cm -3 . In a semi-insulating burying layer, Fe is doped as an impurity generating a deep acceptor level and the concentration thereof is 6.0 × 10 16 cm -3 . The Fe concentration in the p-type clad layer is thus three times higher than the Fe concentration in the burying layer.
申请公布号 EP1981138(A1) 申请公布日期 2008.10.15
申请号 EP20080152599 申请日期 2008.03.11
申请人 FUJITSU LIMITED;EUDYNA DEVICES INC. 发明人 TAKADA, KAN;EKAWA, MITSURU;YAMAMOTO, TSUYOSHI;TAKEUCHI, TATSUYA
分类号 H01S5/227 主分类号 H01S5/227
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