发明名称 |
Semiconductor optical device and manufacturing method thereof |
摘要 |
In a p-type clad layer, not only a p-type dopant Zn but also Fe is doped. Its Zn concentration is 1.5 × 10 18 cm -3 and the Fe concentration is 1.8 × 10 17 cm -3 . In a semi-insulating burying layer, Fe is doped as an impurity generating a deep acceptor level and the concentration thereof is 6.0 × 10 16 cm -3 . The Fe concentration in the p-type clad layer is thus three times higher than the Fe concentration in the burying layer.
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申请公布号 |
EP1981138(A1) |
申请公布日期 |
2008.10.15 |
申请号 |
EP20080152599 |
申请日期 |
2008.03.11 |
申请人 |
FUJITSU LIMITED;EUDYNA DEVICES INC. |
发明人 |
TAKADA, KAN;EKAWA, MITSURU;YAMAMOTO, TSUYOSHI;TAKEUCHI, TATSUYA |
分类号 |
H01S5/227 |
主分类号 |
H01S5/227 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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