发明名称 Process of producing a substrate for liquid crystal display devices comprising a patterned optical retarder
摘要 A process of producing a substrate for a liquid crystal display device comprising an optically anisotropic layer (15), the process including the formation of the optically anisotropic layer (15) by a process comprising the following steps [1] to [3]: [1] preparing a substrate (12) having a raw optically anisotropic layer (15); [2] subjecting the raw optically anisotropic layer (15) to patterned exposures of two or more types under different exposure conditions (A,B,C), this step resulting in the formation of domains (15A,15B,15C) exhibiting different retardations; [3] subjecting the substrate obtained after the exposure to a heat treatment at 80°C or higher and 400°C or lower. By the process, a substrate (19) for liquid crystal display device which contributes to reducing viewing angle dependence of colors in a liquid crystal display device can be easily produced.
申请公布号 EP1980901(A1) 申请公布日期 2008.10.15
申请号 EP20080007240 申请日期 2008.04.11
申请人 FUJIFILM CORPORATION 发明人 NAKAJIMA, MASAO;KANEIWA, HIDEKI;AMIMORI, ICHIRO;MORISHIMA, SHINICHI;TOMITA, HIDETOSHI
分类号 G02F1/13363;C09K19/38;G02B5/30 主分类号 G02F1/13363
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