| 摘要 |
A chemical vapor deposition apparatus for a flat plate display device is provided to strongly hold a location of a rear plate for an upper chamber when the location of the rear plate changes by efficiently pressurizing and supporting the rear plate with a simple configuration. A chemical vapor deposition apparatus for a flat plate display device includes a chamber, a rear plate, an insulator(50), and a pressurizing and supporting unit(60). A deposition process for the flat plate display device is performed in the chamber, and the chamber has an upper chamber and a lower chamber. The rear plate is engaged with the upper chamber. The rear plate is electrically connected to a power supply to supply plasma gas into the chamber. The insulator is provided between the rear plate and an inner sidewall of the upper chamber to electrically insulate an inner sidewall of the upper from the rear plate. The pressurizing and supporting unit is disposed to contact with the one side of the insulator. The pressurizing and supporting unit selectively pressurizes the insulator the rear plate side to support the rear plate when the upper chamber is upset. |
