| 摘要 |
PURPOSE:To elevate the reliability of a semiconductor device by detecting fine particles, flaws or the like on the surface of an etching circuit blank with a lamp whose filters are so combined that the maximum output is provided in a specified wavelength range while light is cut off below a specified wavelength. CONSTITUTION:A surface inspection lamp for an etching circuit blank such as semiconductor wafer emploies a combination a spot mercury lamp and a filter. It is so designed that the maximum output is provided in a wavelength of 546-579nm while light is cut off in a wavelength range of below 500nm for exposing a photoresist to light and a filter is arranged in the direction of the lamp irradiates. This betters the detection sensitivity of fine particles, flaws and the like thereby elevating the reliability of the semiconductor. |
