| 摘要 |
PURPOSE:To obtain a photoconductive member resistant to all the environmental conditions and superior in photosensitivity characteristics in longer wavelength side, by laminating a charge transfer layer and a charge generating layer both composed of a specified amorphous material using silicon as a basic material, and further, a surface barrier layer on a substrate. CONSTITUTION:A surface barrier layer 103 for inhibiting outflow of free carriers from the free surface side or inflow of them, a charge generating layer 105 for generating mobile photocarriers on irradiation of electromagnetic waves, and a charge transfer layer 104 for effectively injecting the generated photocarriers are laminated on a substrate 101 for a photoconductive member. The layers 105, 104 contan H or/and halogen atoms, they are composed of an amorphous material of silicon as a basic material, and the layer 105 contains 1X10<-1>-10 atomic % impurities governing its conduction type, thus permitting the obtained photoconductive member to be stable in electrical, optical, and photocondutive characteristics, resistant to all the environmental conditions, and superior in long wavelength side photosensitivity characteristics, and further freed of deterioration even after repeated uses and remaining potential observed. |
