A pattern exposure apparatus comprising a multi-beam spot forming optical system

摘要

A pattern exposure apparatus comprises a plurality of semiconductor lasers 1 , collimator lenses 21 for collimating the plurality of outgoing laser beams, a multi-beam parallelising lens for ensuring that the collimated beams are mutually parallel, a multi-beam spot forming optical system, a stage 4 on which a substrate 5 is mounted, a scanning unit 27 and a control unit 3 for providing control of the individual lasers.