发明名称 Systems and methods for immersion metrology
摘要 Fluid immersion technology can be utilized to increase the resolution and angular range of existing metrology systems. An immersion fluid placed between the metrology optics and the sample can reduce the refraction at the sample interface, thereby decreasing the spot size of the beam on a feature of the sample while simultaneously increasing the angular range of the system. The decreased spot size, in combination with an increased angular spread, allows an existing metrology system to measure parameters of a sample, such as a semiconductor or microelectronic device, with improved resolution and without expensive and/or complex changes to the mechanics of the metrology system.
申请公布号 US7436527(B2) 申请公布日期 2008.10.14
申请号 US20070732125 申请日期 2007.04.02
申请人 KLA-TENCOR CORPORATION 发明人 OPSAL JON
分类号 G01B11/28;G01B11/06;G01N21/88 主分类号 G01B11/28
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