| 发明名称 |
Method for forming a porous polishing pad |
| 摘要 |
The present invention provides a method of forming a chemical mechanical polishing pad comprising providing a polymeric matrix with fluid-filled unexpanded microspheres, curing the polymeric matrix and heating the polymeric matrix and the microspheres to expand the microspheres. |
| 申请公布号 |
US7435364(B2) |
申请公布日期 |
2008.10.14 |
| 申请号 |
US20060398265 |
申请日期 |
2006.04.04 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
发明人 |
JAMES DAVID B.;KULP MARY JO;ROBERTS JOHN V. H. |
| 分类号 |
B29C44/06 |
主分类号 |
B29C44/06 |
| 代理机构 |
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