HEALING ABUTMENT IN DENTAL IMPLANT WITH CHARGE BALANCED BIPHASIC ELECTRICAL CURRENT STIMULATOR

摘要

A healing abutment in dental implant with charge balanced biphasic electric current stimulator is provided to increase density of bone mineral early by acceleration of bone generation, and to reduce a time required for an implant operation, due to effective electric current stimulation. A healing abutment in dental implant with charge balanced biphasic electric current stimulator includes: an electric current stimulating chip(14) for generating a pulse current alternating the positive pole and the negative pole with the same size; at least one electrode connected to the electric current stimulating chip, and receiving the pulse current generated from the electric current stimulating chip; and an insulating package(12) surrounding the electric current stimulating chip, and mutually insulating at least one electrode by being filled into a space between the electrodes. At least one electrode includes an upper electrode(11) and a lower electrode(17).