| 摘要 |
FIELD: metallurgy. ^ SUBSTANCE: invention concerns formation techniques of ultrahard alloyed carbonic coating on silicon in vacuum and can be used in devices of micromechanics and in the capacity of coatings for details of infrared optics. Method includes ionisation of alloying element, in the capacity of which it is used nitrogen, and carbon from which cathode is manufactured, by means of vacuum-arc discharge in evacuated vessel and further deposition of carbon ions and alloying element on silicon substrate. For carbon and alloying element ionisation it is used pulsed vacuum-arc discharge. At that at first on substrate there are deposed carbon ions, and then carbon and alloying element ions. Substrate temperature is supported not higher than 373°K. Carbon ions are hastened till the energy 40-100 eV. Alloying element - nitrogen is introduced into evacuated vessel till the pressure in the range 0.001-0.15 Pa. Substrate temperature not higher than 373°K is supported by means of vacuum-arc discharge pulse repetition rate choosing. ^ EFFECT: increasing of endurance, microhardness, fracture strength of silicon with coating. ^ 3 cl, 3 ex |
