| 摘要 |
PROBLEM TO BE SOLVED: To stabilize the processing performance of a plasma treatment apparatus in which a hardly removable element remains in its inside. SOLUTION: The processing performance stabilizing method of a plasma treatment apparatus has a step 104 for cleaning the inside of a plasma treatment chamber, a step 102 for forming a coating film for coating the inside of the plasma treatment chamber and a step 103 of executing plasma treatment for a target processing workpiece. In the step of forming the coating film, the coating (at least any one of silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, carbon and halocaron) is allowed to contain a substance (one or more selected from among halogen, carbon, sulfur, metal oxide and metal halide) which is hardly removed even when using a step of cleaning the workpiece by using a gas containing an element or a substance (HCl, HBr, HI, H<SB>2</SB>, CHF<SB>3</SB>, CH<SB>4</SB>, CHxCly, CHxBry, and CHxIy (x=1 to 3, y=4-x) and SiH<SB>4</SB>) for promoting the formation of the coating film. COPYRIGHT: (C)2009,JPO&INPIT
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