| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask data generation system by which photomask data is generated even without special expert knowledge. <P>SOLUTION: The photomask data generation system 1 is provided with: a mask specification generator 12 which generates mask specifications of a photomask used for manufacturing of a semiconductor based on design conditions, manufacturing conditions input from a terminal 11 and manufacturing origin information of the photomask; a graphic operation processing specification generator 13 which generates graphic operation processing specifications to design data of the semiconductor based on the mask specifications; a graphic operation processor 14 which performs graphic operation processing to the design data of the semiconductor based on the graphic operation processing specifications and a photomask data generator 15 which generates photomask data from the design data by which the graphic operation processing is performed based on the mask specifications. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
