发明名称 |
FILM ADHESIVENESS EVALUATION METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a film adhesiveness evaluation method having high reliability. <P>SOLUTION: This evaluation method of adhesiveness to a substrate, of a film in the covered state with a resin has a film forming process for providing a film on the substrate; a cut line forming process for forming a cut line on the film provided in the film forming process; a resin sealing process for covering the film with the resin after the cut line forming process; and a measuring process for placing a sample acquired in the resin sealing process under a prescribed condition, and measuring an exfoliation degree of the film on which the cut line is formed by using a nondestructive inspection device. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2008241646(A) |
申请公布日期 |
2008.10.09 |
申请号 |
JP20070086269 |
申请日期 |
2007.03.29 |
申请人 |
CONSORTIUM FOR ADVANCED SEMICONDUCTOR MATERIALS &RELATED TECHNOLOGIES |
发明人 |
MINAMIHASHI KATSUYA;SEKI GENTARO |
分类号 |
G01N3/00;G01N29/00;H01L21/312;H01L21/66 |
主分类号 |
G01N3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|