发明名称 FILM ADHESIVENESS EVALUATION METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a film adhesiveness evaluation method having high reliability. <P>SOLUTION: This evaluation method of adhesiveness to a substrate, of a film in the covered state with a resin has a film forming process for providing a film on the substrate; a cut line forming process for forming a cut line on the film provided in the film forming process; a resin sealing process for covering the film with the resin after the cut line forming process; and a measuring process for placing a sample acquired in the resin sealing process under a prescribed condition, and measuring an exfoliation degree of the film on which the cut line is formed by using a nondestructive inspection device. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008241646(A) 申请公布日期 2008.10.09
申请号 JP20070086269 申请日期 2007.03.29
申请人 CONSORTIUM FOR ADVANCED SEMICONDUCTOR MATERIALS &RELATED TECHNOLOGIES 发明人 MINAMIHASHI KATSUYA;SEKI GENTARO
分类号 G01N3/00;G01N29/00;H01L21/312;H01L21/66 主分类号 G01N3/00
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