| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus having high corrosion resistance against a hydrogen fluoride gas and capable of preventing a metal constituting a processing chamber from adhering as a foreign matter on a substrate. SOLUTION: The substrate processing apparatus 1 is provided with a plurality of supporting posts 29 for supporting a substrate K; the processing chamber 11 having a closed space and allowing each of the supporting posts 29 to be disposed in its inside; and a gas supply device 30 for supplying a processing gas containing a hydrogen fluoride gas to the inside of the processing chamber 11. The apparatus 1 uses the processing gas supplied into the processing chamber 11 to process the substrate K supported on the supporting posts 29. In the processing chamber 11, coatings 22, 23, 24, 25 and 26 each made of polyimide are formed on its inner surface. In each of the supporting posts 29, a coating made of polyimide is formed on its outer surface. COPYRIGHT: (C)2009,JPO&INPIT
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