发明名称 Exposing Method, Exposure Apparatus, Device Fabricating Method, and Film Evaluating Method
摘要 An exposing method has: a process that forms an immersion region of a liquid on a substrate; a process that determines exposure conditions in accordance with an adhesive force that acts between a surface of the substrate and the liquid; and a process that, based on the exposure conditions, exposes the substrate through the liquid of the immersion region.
申请公布号 US2008246937(A1) 申请公布日期 2008.10.09
申请号 US20060919351 申请日期 2006.04.25
申请人 NIKON CORPORATION 发明人 NAGASAKA HIROYUKI
分类号 G03B27/42;G03B27/52 主分类号 G03B27/42
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