Vorrichtung zur Verarbeitung eines Substrats auf zwei Seiten

摘要

An apparatus for processing a substrate on two sides. A substrate has a first edge as a leading edge in a process direction and a first side in a face-up orientation. In one embodiment, the apparatus comprises an input pathway (14) for receiving the substrate from a substrate processing station, a station (12) for processing the face-up side of the substrate, a reversion pathway (20,23) for reverting the substrate and returning the reverted substrate to the input pathway. After reversion, a second side of the substrate is in the face up orientation and the first edge is the leading edge. A merge point (21) merges the reverted substrate into the input pathway for processing the face-up side of the substrate in the print station.