| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing device and a substrate processing method, which prevents residual process liquid from falling from a process liquid discharge opening provided at a central axis member by air flow generated in a gap space formed between a shielding member and a substrate top face. SOLUTION: While a lower limit side 6a of a medial axis member 6 being arranged in an upper part position to a lower surface 5a of a shielding member 5, a mixed liquor discharge opening 62a is arranged in an upward evacuated position to the lower limit side 6a of the central axis member 6. On account of this, even when mixed liquor remains and sticks near the mixed liquor discharge opening 62a, an impact of the air flow generated in a gap space SP1 to the residual mixed liquor is reduced. The residual mixed liquor is thereby prevented from falling on a substrate front surface Wf from the mixed liquor discharge opening 62a during the time when a discharge of the mixed liquor from the mixed liquor discharge opening 62a stops. COPYRIGHT: (C)2009,JPO&INPIT
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