发明名称 |
Photomask and Method for Forming a Non-Orthogonal Feature on the Same |
摘要 |
A photomask and method for forming a non-orthogonal feature on the photomask are provided. A method for forming a non-orthogonal feature on a photomask blank includes providing a mask layout file including a primitive shape and fracturing the primitive shape to create a plurality of writeable shapes in a mask pattern file. A non-orthogonal feature formed by the writeable shapes is formed on a photomask blank by using a lithography system to image the writeable shapes from the mask pattern file onto a resist layer of the photomask blank.
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申请公布号 |
US2008248408(A1) |
申请公布日期 |
2008.10.09 |
申请号 |
US20060064453 |
申请日期 |
2006.09.06 |
申请人 |
MACDONALD SUSAN S;MELLENTHIN DAVID |
发明人 |
MACDONALD SUSAN S.;MELLENTHIN DAVID |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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