| 摘要 |
A coated substrate is provided to obtain an underlayer useful for a photolithographic process and capable of preventing images formed thereon from being damaged during a photolithographic process, thereby forming a high-resolution photoresist image. A coated substrate comprises: an organic underlayer coating composition layer containing a nitrile group-containing component; and at least one different organic composition layer formed on the underlayer coating composition layer. The underlayer coating composition comprises a resin containing a nitrile substituent. The resin is a reaction produce of a vinyl nitrile compound, or comprises a nitrile group and/or phenyl group.
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