| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern formation device capable of simplifying a device configuration, of reducing the number of processes for pattern formation, and of rapidly and inexpensively forming a high-positional-accuracy and high-definition pattern comparable to that of a photolithographic technique; and a manufacturing method of a masking plate. SOLUTION: This pattern formation device has a masking plate arranged oppositely to a surface of a glass plate. The masking plate has a substrate 24 having multiple pattern-like through holes 22, and is formed by coating, with annular insulation layers 26a, the inside surfaces of the multiple through holes 22, the back surface 24b of the substrate 24, and the peripheral parts of the through hole 22 within the front surface 24a of the substrate 24. COPYRIGHT: (C)2009,JPO&INPIT
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