发明名称 VAPOR DEPOSITION SYSTEM, AND COIL MEMBER THEREIN
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition system with a structure capable of depositing a layer film of higher quality on an objective substrate at a high speed. SOLUTION: When a coil member 160 to which AC power is applied generates a high frequency magnetic flux, a substrate supporting member 110 composed of an electrically conductive material is heat-generated by the guidance of an eddy current, thus a layer film is formed on the surface of an objective substrate CB heated by this. However, the cross-sectional shape of a metal pipe 161 forming the coil member 160 is rectangular, thus, compared with the conventional example in which cross-sectional shape is circular, the surface area thereof is remarkably increased. In this way, the amount of electric current can be increased without raising the surface potential in the coil member 160. Thus, the density of the high frequency magnetic flux generated from the coil member 160 can be increased, so that the substrate supporting member 10 can be heat-generated more safely at higher temperature and higher speed compared with the conventional case by the high frequency magnetic flux. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008240134(A) 申请公布日期 2008.10.09
申请号 JP20070086649 申请日期 2007.03.29
申请人 FURUKAWA CO LTD 发明人 MITA KAZUTO
分类号 C23C16/46 主分类号 C23C16/46
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