RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR

摘要

A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein R⁴⁰¹ represents an acid dissociable, dissolution inhibiting group; R⁴¹ to R⁴³ each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; and X^- represents an anion) or an acid generator (B1') including a compound represented by general formula (b1-9) shown below (wherein R⁴⁰³ and R⁴⁰³ each independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R⁴⁰⁴ represents an alkyl group or a halogenated alkyl group, wherein R⁴⁰³ and R⁴⁰⁴ may be bonded to each other to form a ring structure; and X^- represents an anion).