| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a stencil mask capable of easily removing a contaminant by cleaning after contamination, irrespective of the kind of a contaminant and of being reutilized keeping conductivity thereof. <P>SOLUTION: A stencil mask 100 for charged particle beam includes a silicon support substrate layer 3, having an opening for transmitting a charged particle beam therethrough; a membrane layer 1 made of a silicon single crystal on which a through pattern that becomes a transfer pattern is formed; and a conductive exfoliation layer 4, formed on opposite side exposed surfaces of the membrane layer 1 and on an exposed surface of the silicon support substrate layer 3 on the opposite side to the intermediate insulating layer 2 side and dissolvable to a mask cleaning solution. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
