| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint method and the like capable of performing more preferable alignment control by devising control conditions on alignment in an imprint process. <P>SOLUTION: The imprint method imprints an imprint pattern of a mold on a pattern formation layer of a substrate. In addition, the method includes a step that suspends positioning control or a step that changes at least one of a control method in a stage that performs positioning control, a driving profile or a control parameter, in order to prevent a malfunction in positioning control caused by the contact of the mold and resin. <P>COPYRIGHT: (C)2009,JPO&INPIT |
