| 摘要 |
Memory cells are described along with arrays and methods for manufacturing. An embodiment of a memory cell as described herein includes a second doped semiconductor region on a first doped semiconductor region and defining a pn junction therebetween. A first electrode on the second doped semiconductor region. An insulating member between the first electrode and a second electrode, the insulating member having a thickness between the first and second electrodes. A bridge of memory material across the insulating member, the bridge having a bottom surface and contacting the first and second electrodes on the bottom surface, and defining an inter-electrode path between the first and second electrodes across the insulating member, the inter-electrode path having a path length defined by the thickness of the insulating member, wherein the memory material has at least two solid phases.
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