A steering element is included in an ion implantation system to direct or "steer" an ion beam (624) to a scan vertex (651) of a scanning element (636) downstream of the steering element. In this manner, the scan vertex of the scanning element coincides with the focal point of a parallelizing element (630) downstream of the scanning element. This allows the beam to emerge from the parallelizing element at an expected angle so that ions can be implanted in a desired manner into a workpiece located downstream of the parallelizing element.
