发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <p>In a second direction, an n-channel MOS transistor and an expanding film (11) are adjacent to each other in a planar view. For this, the n-channel MOS transistor receives a positive stress from the expanding film (11) in a direction to expand its channel length. As a result, positive distortion is caused in an electron moving direction in the n-channel MOS transistor. Meanwhile, in the second direction, a p-channel MOS transistor and the expanding film (11) are shifted to each other. For this, the p-channel MOS transistor receives a positive stress in a direction to narrow a channel length from the expanding film (11). As a result, a positive compressing distortion is caused in a hole moving direction. Thus, both turned-on electric currents of the n-channel MOS transistor and the p-channel MOS transistor can be improved.</p>
申请公布号 WO2008120378(A1) 申请公布日期 2008.10.09
申请号 WO2007JP56940 申请日期 2007.03.29
申请人 FUJITSU MICROELECTRONICS LIMITED;TANABE, RYOU 发明人 TANABE, RYOU
分类号 H01L21/8238;H01L21/822;H01L21/8244;H01L27/04;H01L27/08;H01L27/092;H01L27/11;H01L29/78 主分类号 H01L21/8238
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