发明名称 VERTICAL SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a low-cost vertical semiconductor element satisfying both high voltage resistance and low-ON resistance and also provide a method for manufacturing the vertical semiconductor element. SOLUTION: The vertical semiconductor element includes a conductive substrate 1, a nitride compound semiconductor layer 4 formed on the conductive substrate 1 to expose a part of the front surface of the conductive substrate 1, a buffer layer 3 formed between the conductive substrate 1 and the nitride compound semiconductor layer 4, a first electrode 7 formed on the nitride compound semiconductor layer 4, a second electrode 11 formed at a lower surface of the conductive substrate 1, and a bypass section 5' for electrically connecting at least a part of the exposed area on the front surface of the conductive substrate 1 and at least a part of a side surface of the nitride compound semiconductor layer 4 and allowing at least a part of current flowing in the vertical direction between the first electrode 7 and the second electrode 11 to pass. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008243835(A) 申请公布日期 2008.10.09
申请号 JP20070077580 申请日期 2007.03.23
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 SATO YOSHIHIRO
分类号 H01L29/47;H01L21/336;H01L29/12;H01L29/78;H01L29/872 主分类号 H01L29/47
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