| 摘要 |
PROBLEM TO BE SOLVED: To realize a film deposition apparatus of high film deposition efficiency relating to a substrate holder in a vacuum vapor deposition, a film deposition apparatus, and a film deposition method. SOLUTION: The substrate holder 50 which holds a plurality of the substrates W on the planar inverting tools 57 holding the substrates and holds four sheets of the inverting tools 57 is arranged in a vacuum chamber in such a manner that the substrates W and a vapor deposition source face each other, and the vacuum deposition is started. When films are deposited on the substrates W facing the vapor deposition source, the substrate holder 50 is rotated 90. The inverting tools 57 deposited with the film on one surface is inverted by rotating a Geneva 581 integrated with the inverting tools 57. The vacuum deposition is continued until the films are deposited on both surfaces of all the inverting tools 57. COPYRIGHT: (C)2009,JPO&INPIT
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