发明名称 |
COMPOSITION FOR REMOVING RESIDUE FROM WIRING BOARD AND CLEANING METHOD |
摘要 |
Disclosed is a composition for removing residues from wiring boards, which contains an oxidizing agent and an azole compound while having a pH of 1-7. Also disclosed is a method for cleaning a wiring board wherein residues are removed from a wiring board after dry etching by using such a composition. By using such a composition for removing residues, residues remaining after dry etching which are derived from the resist or metals can be effectively removed without corroding highly corrosion-prone titanium or titanium alloys during production of a wiring board. Consequently, a semiconductor device using a wiring board particularly containing titanium or a titanium alloy can be produced efficiently. |
申请公布号 |
KR20080091096(A) |
申请公布日期 |
2008.10.09 |
申请号 |
KR20087013938 |
申请日期 |
2006.12.14 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
KUWABARA EIKO;KASHIWAGI HIDEO;MATSUNAGA HIROSHI;OHTO MASARU |
分类号 |
C11D7/18;C11D7/32;C11D7/60 |
主分类号 |
C11D7/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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