发明名称 COMPOSITION FOR REMOVING RESIDUE FROM WIRING BOARD AND CLEANING METHOD
摘要 Disclosed is a composition for removing residues from wiring boards, which contains an oxidizing agent and an azole compound while having a pH of 1-7. Also disclosed is a method for cleaning a wiring board wherein residues are removed from a wiring board after dry etching by using such a composition. By using such a composition for removing residues, residues remaining after dry etching which are derived from the resist or metals can be effectively removed without corroding highly corrosion-prone titanium or titanium alloys during production of a wiring board. Consequently, a semiconductor device using a wiring board particularly containing titanium or a titanium alloy can be produced efficiently.
申请公布号 KR20080091096(A) 申请公布日期 2008.10.09
申请号 KR20087013938 申请日期 2006.12.14
申请人 MITSUBISHI GAS CHEMICAL COMPANY, INC. 发明人 KUWABARA EIKO;KASHIWAGI HIDEO;MATSUNAGA HIROSHI;OHTO MASARU
分类号 C11D7/18;C11D7/32;C11D7/60 主分类号 C11D7/18
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