发明名称 Single electron transistor and method of manufacturing the same
摘要 A single electron transistor includes source/drain layers disposed apart on a substrate, at least one nanowire channel connecting the source/drain layers, a plurality of oxide channel areas in the nanowire channel, the oxide channel areas insulating at least one portion of the nanowire channel, a quantum dot in the portion of the nanowire channel insulated by the plurality of oxide channel areas, and a gate electrode surrounding the quantum dot.
申请公布号 US2008246021(A1) 申请公布日期 2008.10.09
申请号 US20070905758 申请日期 2007.10.03
申请人 SAMSUNG ELECTRONIC CO., LTD., 发明人 SUK SUNG-DAE;YEO KYOUNG-HWAN;LI MING;YEOH YUN-YOUNG
分类号 H01L29/12;H01L21/336 主分类号 H01L29/12
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