SPUTTERING TARGET AND SPUTTERING APPARATUS USING THE SAME, AND FEBRICATION METHOD FOR SPUTTERING TARGET

摘要

A sputtering target, a sputtering apparatus using the same, and a method for manufacturing the same are provided to enhance efficiency of the sputtering target by detachably installing a block, which is made from a material identical to a material of the sputtering target, to a backing plate. A sputtering target comprises a backing plate(10), a plurality of grooves(16) formed in the backing plate, a plurality of blocks(20) inserted into the grooves, and a target member(40) bonded to a front surface of the backing plate. Each block is detachably inserted into each groove. The grooves are formed at both peripheral edges of the backing plate. Each groove has a polygonal shape or a circular shape. The backing plate includes a base frame and a protrusion(12), which protrudes from the base frame by a predetermined height.