| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive working resist composition having high sensitivity and satisfying both no pattern collapse and less variation in line width, and to provide a pattern forming method. <P>SOLUTION: The positive working resist composition comprises a resin having a specified end terminal structure and a plurality of specified acid-decomposable groups. The pattern forming method is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
