| 摘要 |
<P>PROBLEM TO BE SOLVED: To accurately measure the spherical aberration and coma aberrations of a projection optical system with a simple technique. <P>SOLUTION: In order to measure the aberration of the projection optical system for projecting the image of a reticle on a substrate, a master mark is first projected on a substrate mark via the projection optical system under two or more different illumination conditions, and a positioning state of a reticle mark and the substrate mark is detected under each of the illumination conditions. After that, the aberrations of the projection optical system are calculated, based on the difference in the positioning state under each of the illumination conditions, and the positioning state is detected by using a position sensor which positions the reticle and the substrate with the reticle mark and the substrate mark. <P>COPYRIGHT: (C)2009,JPO&INPIT |
