发明名称 PRODUCTION OF PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To obtain the lithographic plate having a less residual color and a less tendency for generating coming by incorporating a specific amount of at least one of a solvent selected from propylene glycol monoethylether and diacetone alcohol, etc. CONSTITUTION:The solvent contains at least 10wt% of one or more solvent selected from propylene glycol monoethylether, propylene glycol mono-n- propylether, propylene glycol monoisopropylether, propylene glycol monoacetate, propylene glycol and diacetone alcohol. The total amount of propylene glycol monoethylether and diacetone alcohol contd. in the solvent of the coating solution is 10-100%, preferably 40-100%, more preferably 60-100% on the weight basis of the solution contd. in the coating solution. As to the substrate, the anodic oxidized aluminium plate after giving a rough surface thereto is used.
申请公布号 JPS62169163(A) 申请公布日期 1987.07.25
申请号 JP19860011244 申请日期 1986.01.22
申请人 FUJI PHOTO FILM CO LTD 发明人 NAGASHIMA AKIRA;NISHIOKA AKIRA
分类号 G03C1/00;G03F7/00;G03F7/004;(IPC1-7):G03F7/02 主分类号 G03C1/00
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