| 摘要 |
PROBLEM TO BE SOLVED: To highly accurately obtain an ion implantation amount, even when the ion implantation amount is relatively small and an ion implantation depth is very shallow. SOLUTION: An object substrate constituted by laminating a plurality of respectively different materials, for which the materials other than the material of the top surface layer among the plurality of materials are resistant to a liquid chemical, with which the material of the top surface layer to which ions are implanted can be wet-etched is provided. The top surface layer is selectively etched using the liquid chemical, and the liquid chemical after etching, in which the components of the top surface layer including the implanted ions are mixed, is recovered; and by either atomic absorption analysis or inductively coupled plasma mass spectrometry, the amount of the ions contained in the recovered liquid chemical after etching is measured as the amount of the ions implanted to the object substrate. COPYRIGHT: (C)2009,JPO&INPIT
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