| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate heating device for measuring the temperature of a ceramic base at the time of high temperature heating such as the formation of an oxide film and plasma etching in a plurality of heating regions corresponding to a plurality of heat generators. SOLUTION: A substrate heating device comprises a plate ceramic base 11 having a substrate mounting surface 11a, a hollow support member 20 joined to a surface 11b opposite to a substrate mounting surface 11a of the ceramic base 11, and temperature measuring resistor bodies 16A and 16B comprising a high melting point material embedded in the ceramic base 11. COPYRIGHT: (C)2009,JPO&INPIT
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