发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device as a hetero-junction field effect transistor that copes with high output and high breakdown voltage, and also to provide its manufacturing method. SOLUTION: The semiconductor device is a hetero-junction field effect transistor, and it is provided with: an Al<SB>x</SB>Ga<SB>1-x</SB>N channel layer 3 that is formed on a substrate at composition ratio x (0<x<1) of Al; an Al<SB>y</SB>Ga<SB>1-y</SB>N barrier layer 4 that is formed on the channel layer 3 at composition ratio y (0<y≤1) of Al; and a source/drain electrode 6 and a gate electrode 7 that are formed on the barrier layer 4. The composition ratio y is larger than the composition x. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008243881(A) 申请公布日期 2008.10.09
申请号 JP20070078306 申请日期 2007.03.26
申请人 MITSUBISHI ELECTRIC CORP 发明人 NANJO TAKUMA;FUKITA MUNEYOSHI;ABE YUJI;OISHI TOSHIYUKI
分类号 H01L21/338;H01L21/205;H01L29/778;H01L29/812 主分类号 H01L21/338
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