| 摘要 |
PROBLEM TO BE SOLVED: To provide a nozzle for depositing a film on a chamfered part, which improves density of the fine particles exactly colliding against the chamfered part of a base material, reduces the ratio of the fine particles not contributing to deposition, has high mechanical strength and can deposit a uniform film, and a deposition apparatus. SOLUTION: The nozzle 1 for depositing the film on the chamfered part which discharges aerosol prepared by dispersing the fine particles into gas toward the chamfered part Sb of the base material has a discharge opening 1a, and the sectional shape perpendicular to the aerosol discharge direction of the opening 1a is a square shape with the width 8a of the base material chamfer 8b as a length on one side or a circular shape with the width 8a of the base material chamfer 8b as a diameter. The deposition apparatus uses the nozzle 1 for depositing the film on the chamfered part. COPYRIGHT: (C)2009,JPO&INPIT
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