| 摘要 |
PURPOSE:To expand an effective exposure area and to increase the degree of freedom for the design and production of semiconductors by reflecting observation light obtained from an alignment mark on a reticule plural times by a plural-times reflecting member so as to lead the plural reflected light rays into an objective lens. CONSTITUTION:A reflecting member is constituted of the plural-times reflecting member (three-times reflecting member 70) for reflecting observation light 20a obtained from the alignment mask 60 plural times and leading the plural reflected light rays into the objective lens 3. Even when the member 70 is arranged so that the 1st reflecting part for reflecting the observation light 20a at first is close to the pattern surface of the reticule 6 and the objective lens 3 is arranged on a position separated from the pattern surface of the reticule 6, the observation light 20a reflected by the 1st reflecting part is again reflected one or more by other reflecting parts of the member 70 and led into the objective lens 3. Consequently, the effective exposure area of the exposure optical system can be expanded within an aberration correcting area and the degree of freedom for the design and production of semiconductors can be increased. |
