| 摘要 |
Embodiments relate to a color filter mask layout that may be capable of reducing an SNR by preventing an occurrence of a corner rounding during manufacturing of a color filter. In embodiments, a color filter mask layout may include a blue color filter mask pattern disposed at a center part, a red color filter mask pattern disposed in a diagonal direction of the blue color filter mask pattern to be spaced apart from the blue color filter mask pattern, a green color filter mask pattern disposed in a diagonal direction of the blue color filter mask pattern to be spaced apart from the blue color filter mask pattern, and a correction mask pattern for an optical proximity correction installed at a corner of the green color filter mask pattern. |
