发明名称 XY STEP EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an XY step exposure device which is free of maldistribution of fine common defects in colored pixels etc., even when intervals of proximity exposure are set while an exposure stage is moved in steps. <P>SOLUTION: A Z assist mechanism 10 which prevents a Z stage 71 from tilting forward on a pedestal 72 in a travel direction of the exposure stage at the end of step movement owing to inertia of the exposure stage 60 due to acceleration during speed reduction is provided between the Z stage and an XY&theta; fine movement stage, and the Z assist mechanism is placed in operation during the step movement to fix the Z stage and XY&theta; fine movement stage 80. A gradient of speed variation during speed reduction of the exposure stage is set to &le;400 mm/sec<SP>2</SP>. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008233621(A) 申请公布日期 2008.10.02
申请号 JP20070074518 申请日期 2007.03.22
申请人 TOPPAN PRINTING CO LTD 发明人 SUZUKI MITSURU;NAKANISHI SHUNSUKE;WATANABE TOSHISHIGE
分类号 G03F7/20;H01L21/68 主分类号 G03F7/20
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