发明名称 UNIFORM BACKGROUND RADIATION OF MASKLESS LITHOGRAPHY
摘要 <P>PROBLEM TO BE SOLVED: To solve at least one of problems which are caused at a joint portion of patterns formed by using an array of a large number of individually controllable elements, or to substantially solve the one of the problems. <P>SOLUTION: A device manufacturing method includes a process that a pattern is given to an array of a plurality of individually controllable elements so as to modulate a radiation beam, and the modulated radiation beam is projected to a substrate. The patterns given to the plurality of individually controllable elements are set so that the modulated radiation beam includes the background radiation of a predetermined magnitude. The predetermined magnitude of the background radiation depends on a position of the array of the individually controllable elements. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008235909(A) 申请公布日期 2008.10.02
申请号 JP20080073319 申请日期 2008.03.21
申请人 ASML NETHERLANDS BV 发明人 DESMEDT PAUL ANTOON CYRIEL;TINNEMANS PATRICIUS ALOYSIUS J;CUPERUS MINNE;GOSSE CHARLES DE BURIISU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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