发明名称 ELECTROMECHANICAL DEVICE, MANUFACTURING METHOD THEREOF AND RESONATOR
摘要 PROBLEM TO BE SOLVED: To provide an electromechanical device which prevents a fluctuation in a resonance frequency and improves a yield by eliminating positional deviation of supports resulting from a deviation in adapting a mask, its manufacturing method and a resonator by the electromechanical device. SOLUTION: The electromechanical device 25 having a moving member 10 arranged on a substrate 5 through space 27 is provided with a protective film 15 for sealing the electromechanical device 25 through space 26, wherein the protective film 15 and the moving member 10 are supported by supports 16A and 16B that penetrate the moving member 10. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008236386(A) 申请公布日期 2008.10.02
申请号 JP20070073234 申请日期 2007.03.20
申请人 SONY CORP 发明人 MITARAI TAKASHI;TADA MASAHIRO
分类号 H03H9/24;B81B3/00;B81C1/00;H03H3/007 主分类号 H03H9/24
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