发明名称 EPITAXIAL CRYSTAL UNDOPED WITH IMPURITIES, EPITAXIAL LAMINATED CRYSTAL, METHOD FOR MANUFACTURING THE CRYSTAL, AND METHOD FOR MANUFACTURING LAMINATED CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide an epitaxial crystal undoped with impurities which does not deteriorate the interface of a crystal layer and increase the manufacturing time, and to provide an epitaxial laminated crystal. SOLUTION: An epitaxial crystal 13 undoped with impurities is grown by a MOVPE method. The crystal is grown, while growth temperatures are changed from the starting time of growth to the growth time; a V/III ratio is changed corresponding to the change in the growth temperature; and consequently, the change in the concentration of residual carbon due to the change in the growth temperature is compensated for, and the concentration of the residual carbon in a thickness direction is maintained constant. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008235808(A) 申请公布日期 2008.10.02
申请号 JP20070077087 申请日期 2007.03.23
申请人 HITACHI CABLE LTD 发明人 NAGAO SHOICHI
分类号 H01L21/20;H01L21/205 主分类号 H01L21/20
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