| 摘要 |
PROBLEM TO BE SOLVED: To provide a focused ion beam device capable of thinly focusing a beam diameter and changing an ion beam current in a wide range. SOLUTION: The focused ion beam device comprises: a plasma generator 3 having a plasma torch 2 which maintains plasma in the inside and makes the plasma flow in the inside; a differential exhaust chamber 5 connecting with the plasma torch via a torch orifice 4 and making the plasma flow out from the torch orifice 4 into a supersonic flow by means of adiabatic expansion; a pulling-out orifice 6 arranged at a position facing to the torch orifice of the differential exhaust chamber and pulling out an ion from the plasma made as the supersonic flow; a pulling-out electrode 7 for pulling out the ion passing through the pulling-out orifice by further electrostatically accelerating the ion; and an ion optical system 13 for making the ion pulled out from the pulling-out orifice made incident into a workpiece 15 by focusing the ion while adding an ion-optical operation. COPYRIGHT: (C)2009,JPO&INPIT
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