发明名称 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
摘要 A method of fabricating a semiconductor device is provided. Devices are formed on a core region and a non-core region in a substrate. A strain process is performed to the device on the core region but is not performed to the device on the non-core region.
申请公布号 US2008237659(A1) 申请公布日期 2008.10.02
申请号 US20070691708 申请日期 2007.03.27
申请人 UNITED MICROELECTRONICS CORP. 发明人 YANG CHIN-SHENG
分类号 H01L29/94;H01L21/00;H01L21/336 主分类号 H01L29/94
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