| 摘要 |
<p>Provided is a filming apparatus comprising a treating container (31) and a placing bed (71) arranged in the treating container (31) for placing a substrate (W) thereon. The filming apparatus further comprises a gas shower head (51) having a number of gas feeding pores (61a, 62a and 63a) and partitioned into a center region (53) confronting the center portion of the substrate (W) and a peripheral edge region (54) confronting the peripheral edge portion of the substrate (W), first treating gas feeding means for feeding a first treating gas to the center region (53), second treating gas feeding means for feeding a second treating gas to the center region (53), energy feeding means for feeding an energy to cause the first treating gas and the second treating gas to react on the substrate (W), and purge gas feeding means for feeding a purge gas, when the feed of the first treating gas and the feed of the second treating gas are switched, to the center region (53) and the peripheral edge region (54) of the gas shower head (51).</p> |
